DEV system


Tecn.A. DEV
Ultrafiltration systems to regenerate spent solutions 
from photoresist and soldermask processes

A very important TECN.A. application for the P.W.B. industry is represented by the use of ultrafiltration membranes to regenerate the spent solutions from photoresist and soldermask processes.

Ultrafiltration is a physical filtration process with highly specialized membranes that allows to separate the dissolved photoresist from the developing solution.

TECN.A. has developed two lines of systems for the photoresist, to provide better treatment solutions:

THE ULTRAFILTRATION PROCESS

The developing reaction may be represented as: 
Na2CO3 + R-COOH =NaHCO3 + NaOOCR
The Ultrafiltration membrane separates the molecule  NaOOCR from the ions HCO3-/CO3-- turning them available for a later reuse, and obtaining a recuperation of AT LEAST 90% of the chemical solution.
The TECN.A DEV system continually reconverts the bicarbonates in carbonates, keeping the developing solution concentration at constant values

ADVANTAGES


Direct connection UF-developing machine

TECN.A. DEV - model 10TA


Detail of automatic
sponge balls system

Detail of automatic rinse system

MODEL

CAPACITY

DEV 10TA

200 lt/h

DEV 2X10TA

400 lt/h

DEV 3X10TA

600 lt/h

Copyright 2005-2017 - Tecn.A. - Website design by Roberto Delpiano