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A very important TECN.A. application for the P.W.B. industry is represented by the use of ultrafiltration membranes to regenerate the spent solutions from photoresist and soldermask
processes.
 Ultrafiltration is a physical filtration process with highly specialized membranes
that allows to separate the dissolved photoresist from the developing solution.
TECN.A. has developed two lines of systems for the photoresist, to provide better treatment solutions:
- TECN.A UF-DEV for the developing process
- TECN.A UF-STRIP for the stripping process
THE ULTRAFILTRATION PROCESS
The developing reaction may be represented as:
Na2CO3 + R-COOH =NaHCO3 + NaOOCR
The Ultrafiltration membrane separates the molecule NaOOCR from the ions
HCO3-/CO3-- turning them available for a later reuse, and obtaining a recuperation of AT LEAST 90% of the chemical solution.
The TECN.A DEV system continually reconverts the bicarbonates in carbonates, keeping the developing solution concentration at constant values.
ADVANTAGES
- A constant break point.
- A higher definition of the board paths during the development.
- A considerable reduction of the maintenance on the machine, because the developing solution is always clean (ultrafiltered).
- Environmental advantages
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